NIST and Intel Get Critical (Dimensions) with X-rays
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NIST and Intel Get Critical (Dimensions) with X-rays
10/20/2015 04:23 PM EDT
Researchers from the National Institute of Standards and Technology (NIST) and Intel reported* success using an X-ray scattering technique to accurately measure features on a silicon chip to within fractions of a nanometer, or about the width of a single silicon atom.
